K210041
Substantially EquivalentHySil Plus Impression Materials
- Applicant
- Osstem Implant Co., Ltd.
- Product code
- ELW
- Advisory panel
- Dental
- Date received
- Decision date
- Decision
- Substantially Equivalent
- Clearance type
- Traditional
- Location
- Busan, KR
Data sourced from openFDA. This site is unofficial and independent of the FDA.